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Swaminathan "Sam" Sivakumar is an Intel Fellow and director of Lithography in Intel's Portland Technology Development Group in Oregon. He is responsible for the definition, development and deployment of Intel's next generation lithography processes.
Sivakumar joined Intel in 1990 and throughout his career with the company has worked in the lithography area on photoresists, patterning equipment and process development. He has contributed to lithography development, characterization and transfer to high-volume manufacturing of every submicron process technology generation at Intel since 1990. He co-invented industry-leading interconnect patterning techniques for aluminum metallization on the 180 nanometer process as well as for dual-damascene copper metallization on the 130 nanometer and newer processes.
Sivakumar received his bachelor's degree in electrical engineering from the Indian Institute of Technology in Madras, India in 1987. He received his master's degree, also in electrical engineering from the University of Illinois at Urbana-Champaign two years later.
Sivakumar has received three Intel Achievement Awards for his work on P854 speed performance and for development of advanced aluminum and dual-damascene copper interconnect processes. He has published 14 papers on semiconductor processing. He holds 10 patents on lithography and patterning with another 13 patents pending.
Sivakumar was born in 1966 in Madras, India. | 